IEDM Press Kit shows few figures from STMicro presentation of its quantum dot NIR/SWIR imager paper:
Paper #23.4, “1.62µm Global Shutter Quantum Dot Image Sensor Optimized for Near and Shortwave Infrared,” J.S. Steckel et al, STMicroelectronics
Record Quantum Efficiency for NIR/SWIR Sensors: STMicroelectronics researchers will report a 1.62µm pixel-pitch global shutter sensor for imaging in the near-infrared (NIR) and shortwave infrared (SWIR) regions of the light spectrum. It demonstrated record optical performance: an unprecedented quantum efficiency of >50% and a shutter efficiency of >99.94%. The breakthrough was made possible by use of a novel colloidal PbS quantum dot thin-film technology, and the devices were fabricated on a 300mm manufacturing toolset.
- The top photo is of a qualification wafer showing (a) elementary quantum film (QF) test structures; (b) pixel matrix test chips; and (c) full image sensor products.
- Going from left to right in the middle set of images/drawings are a QF photodiode array integrated on top of a CMOS readout IC; the QF photodiode cross-section; and a graphical description of the device stack.
- At the bottom is an outdoor image taken with the 940nm NIR QF sensor (left) and with a high-end smartphone camera (right). The NIR image shows a significant difference in contrast, and the ability to clearly identify the black electrical wires hidden in the tree leaves, vs. the visible image.
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